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Optical Engineering

Experiments and analysis on Joule heating effect in field-assisted ion diffusion
Author(s): Yinlei Hao; Bin Zheng; Weiwei Zheng; Jianyi Yang; Xiaoqing Jiang; Qiang Zhou; Minghua Wang; Hongjian Wang
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Paper Abstract

Due to the Joule heating effect induced by the use of an assisting electric field, glass wafer temperature is experimentally found to increase synchronically with the flow of current during the process of field-assisted ion diffusion. A theoretical analysis demonstrates that the amplitude of the glass wafer temperature increase is dictated by competition between two factors, heat generation and heat dissipation. Heat generation and heat dissipation both become stronger as the glass wafer temperature increases. Studies have shown that the Joule heating effect can influence the waveguide manufacturing process profoundly, including aspects such as the stability of ion diffusion, theoretical modeling of the ion-diffusion process, and waveguide depth uniformity over the glass wafer.

Paper Details

Date Published: 9 February 2012
PDF: 7 pages
Opt. Eng. 51(1) 014601 doi: 10.1117/1.OE.51.1.014601
Published in: Optical Engineering Volume 51, Issue 1
Show Author Affiliations
Yinlei Hao, Zhejiang Univ. (China)
Bin Zheng, Zhejiang Univ. (China)
Weiwei Zheng, Zhejiang Univ. (China)
Jianyi Yang, Zhejiang Univ. (China)
Xiaoqing Jiang, Zhejiang Univ. (China)
Qiang Zhou, Zhejiang Univ. (China)
Minghua Wang, Zhejiang Univ. (China)
Hongjian Wang, Zhejiang Nanfang Communications Group Co., Ltd. (China)

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