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Journal of Photonics for Energy

Silicon on glass grown from indium and tin solutions
Author(s): Roman Bansen; Christian Ehlers; Thomas Teubner; Klaus Böttcher; Karen Gambaryan; Jan Schmidtbauer; Torsten Boeck
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Paper Abstract

A two-step process is used to grow crystalline silicon (c-Si) on glass at low temperatures. In the first step, nanocrystalline seed layers are formed at temperatures in the range of 230 to 400°C by either metal-induced crystallization or by direct deposition on heated substrates. In the second step, c-Si is grown on the seed layer by steady-state liquid phase epitaxy at a temperature range of 580 to 710°C. Microcrystalline Si layers with grain sizes of up to several tens of micrometers are grown from In and Sn solutions. Three-dimensional simulations of heat and convective flow in the crucible have been conducted and give valuable insights into the growth process. The experimental results are promising with regard to the designated use of the material in photovoltaics.

Paper Details

Date Published: 4 May 2016
PDF: 10 pages
J. Photon. Energy 6(2) 025501 doi: 10.1117/1.JPE.6.025501
Published in: Journal of Photonics for Energy Volume 6, Issue 2
Show Author Affiliations
Roman Bansen, Leibniz-Institut für Kristallzüchtung (Germany)
Christian Ehlers, Leibniz-Institut für Kristallzüchtung (Germany)
Thomas Teubner, Leibniz-Institut für Kristallzüchtung (Germany)
Klaus Böttcher, Leibniz-Institut für Kristallzüchtung (Germany)
Karen Gambaryan, Yerevan State Univ. (Armenia)
Jan Schmidtbauer, Leibniz-Institut für Kristallzüchtung (Germany)
Torsten Boeck, Leibniz-Institut für Kristallzüchtung (Germany)

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