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Journal of Nanophotonics

Multiexposure laser interference lithography
Author(s): Abdollah Hassanzadeh; Mohammadbagher Mohammadnezhad; Silvia Mittler
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Paper Abstract

Nanopatterns resulting from two-beam interference in single, double, and multiexposures were simulated. Several patterns were experimentally fabricated to compare with the simulated patterns, allowing judgment of the quality of the simulation tool. Experimental and simulation results were consistent for single and double exposures. Photoresist nanofibers attached and detached from the substrate were fabricated with few changes in the development process. Results show that by increasing the number of exposures, a wide variety of patterns with very fine structures and sophisticated geometries can be generated. Fresnel-lens type structures are formed when the number of exposures is increased. These Fresnel-like patterns might have potential use in obtaining radial and azimuthal polarizations and optical vortices in addition to areas such as security patterns and diffractive optical elements.

Paper Details

Date Published: 2 July 2015
PDF: 12 pages
J. Nanophoton. 9(1) 093067 doi: 10.1117/1.JNP.9.093067
Published in: Journal of Nanophotonics Volume 9, Issue 1
Show Author Affiliations
Abdollah Hassanzadeh, Univ. of Kurdistan (Iran, Islamic Republic of)
Mohammadbagher Mohammadnezhad, Univ. of Kurdistan (Iraq)
Silvia Mittler, The Univ. of Western Ontario (Canada)

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