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Journal of Nanophotonics

Correction of positioning error in Talbot lithography under noncoherent illumination
Author(s): Milad Gharooni; Abbas Chimeh; Bahador Valizadeh; Shams Mohajerzadeh; Mahmoud Shahabadi
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Paper Abstract

A method for the correction of positioning error in Talbot lithography is proposed and investigated both experimentally and theoretically. The enhancement of the features in this method is achieved by the temporally noncoherent illumination, which leads to the overlap between Talbot images of different frequencies. This results in an improvement in the depth of focus and, thus, less sensitive patterns to the positioning error. A spectral-domain analysis for the estimation of the positioning error is employed for the verification and finding of a criterion for selecting appropriate light sources.

Paper Details

Date Published: 6 November 2014
PDF: 8 pages
J. Nanophoton. 8(1) 084089 doi: 10.1117/1.JNP.8.084089
Published in: Journal of Nanophotonics Volume 8, Issue 1
Show Author Affiliations
Milad Gharooni, Univ. of Tehran (Iran)
Abbas Chimeh, Univ. of Tehran (Iran, Islamic Republic of)
Bahador Valizadeh, Univ. of Tehran (Iran, Islamic Republic of)
Shams Mohajerzadeh, Univ. of Tehran (Iran, Islamic Republic of)
Mahmoud Shahabadi, Univ. of Tehran (Iran)


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