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Journal of Nanophotonics

Plane demagnifying nanolithography by hybrid hyperlens–superlens structure
Author(s): Gaofeng Liang; Zeyu Zhao; Na Yao; Changtao Wang; Bo Jiang; Qing Zhao; Xiangang Luo
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Paper Abstract

We propose a hybrid hyperlens–superlens structure to achieve demagnifying nanolithography. It consists of a core of planar superlens and a shell of cylinder hyperlens. In the nanolithography process, the shell of the cylinder hyperlens could demagnify the mask patterns to the interior cylinder interface, and then the core of the planar superlens transmits the demagnified patterns to the planar output photoresist layer. The performance of this hybrid hyperlens–superlens structure is analyzed for different periods and spacing of mask and demagnification factors. The numerical simulation results agree well with the theory. It is demonstrated that the hybrid structure could be used as a superresolution device for plane demagnifying nanolithography.

Paper Details

Date Published: 10 July 2014
PDF: 7 pages
J. Nanophoton. 8(1) 083080 doi: 10.1117/1.JNP.8.083080
Published in: Journal of Nanophotonics Volume 8, Issue 1
Show Author Affiliations
Gaofeng Liang, Univ. of Electronic Science and Technology of China (China)
Chinese Academy of Sciences (China)
Zeyu Zhao, Institute of Optics and Electronics (China)
Na Yao, Institute of Optics and Electronics (China)
Changtao Wang, Institute of Optics and Electronics (China)
Bo Jiang, No. 33 Research Institute of China Electronics Technology Group Corporation (China)
Qing Zhao, Univ. of Electronic Science and Technology of China (China)
Xiangang Luo, Institute of Optics and Electronics (China)

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