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Journal of Nanophotonics

Improving deep subwavelength imaging through terminal interface design of metallo-dielectric multilayered stacks
Author(s): Jigang Hu; Qiwen Zhan; Junxue Chen; Xiangxian Wang; Yonghua Lu; Hai Ming
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Paper Abstract

Symmetric metallo-dielectric multilayered stacks (MDMS) are investigated to improve the spatial resolution of subwavelength imaging operated in canalization regime. Simulation results revealed that subwavelength imaging capability is very sensitive to the thickness and material of the MDMS terminal layers. Furthermore, the coupling and decoupling of the Bloch modes in MDMS, between the object and image space, strongly depend on the terminal layer parameters which can be tuned to achieve the optimal imaging improvement. In contrast to metal-dielectric periodic MDMS, using MDMS with the developed symmetric surface termination, subwavelength imaging with optimal intensity throughput and improved field spatial resolution (∼20.4% ) can be obtained. Moreover, optical singularity, in the form of Poynting vector saddle point, has been found in the free space after lens exit for the two kinds of symmetric MDMS that exhibit improved superresolution imaging performance with 100% energy flux visibility. The improved subwavelength imaging capabilities, offered by this proposed termination design method, may find potential applications in the areas of biological imaging, sensing, and deep subwavelength lithography, and many others.

Paper Details

Date Published: 14 May 2013
PDF: 14 pages
J. Nanophoton. 7(1) 073091 doi: 10.1117/1.JNP.7.073091
Published in: Journal of Nanophotonics Volume 7, Issue 1
Show Author Affiliations
Jigang Hu, Hefei Univ. of Technology (China)
Qiwen Zhan, Univ. of Dayton (United States)
Junxue Chen, Univ. of Science and Technology of China (China)
Xiangxian Wang, Univ. of Science and Technology of China (China)
Yonghua Lu, Univ. of Science and Technology of China (China)
Hai Ming, Univ. of Science and Technology of China (China)

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