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Journal of Nanophotonics

Analysis of random antireflective structures fabricated by silver dewetting to enhance transmission
Author(s): Xiangdong Kong; Yuegang Fu; Weiguo Zhang; Lianhe Dong; Jianhong Zhou; Deqiang Wang
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Paper Abstract

The random antireflective structures are modeled by the analysis of the random morphology distribution. According to the effective medium theory, the transmission of the antireflective structure is calculated by dividing the structure into multilayer, and the dependence on parameters of the subwavelength is analyzed in detail. In the single-variable condition, etching depth, half breadth of distribution, and median of distribution get a positive correlation with the transmittance where the etching depth plays a most important part in enhancing the transmittance, whereas the angle of structures gets a negative correlation. The experimental results coincide well with the calculation and analysis. The analysis offers a theory guidance to fabricate random subwavelength antireflected structures using metal dewetting.

Paper Details

Date Published: 15 September 2017
PDF: 9 pages
J. Nanophoton. 11(3) 036019 doi: 10.1117/1.JNP.11.036019
Published in: Journal of Nanophotonics Volume 11, Issue 3
Show Author Affiliations
Xiangdong Kong, Changchun Univ. of Science and Technology (China)
Chongqing Institute of Green and Intelligent Technology (China)
Yuegang Fu, Changchun Univ. of Science and Technology (China)
Key Lab. of Optoelectric Measurement and Optical Information Transmission Technology (China)
Weiguo Zhang, Chongqing Institute of Green and Intelligent Technology (China)
Lianhe Dong, Changchun Univ. of Science and Technology (China)
Jianhong Zhou, Changchun Univ. of Science and Technology (China)
Deqiang Wang, Chongqing Institute of Green and Intelligent Technology (China)


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