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Journal of Nanophotonics

Pulsed laser interference patterning of polyimide grating for dye-doped polymer laser
Author(s): Soon Yie Kok; Teck Yong Tou; Seong Ling Yap; Seong Shan Yap
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Paper Abstract

Direct laser interference patterning of polyimide (PI) films was performed by using a pulsed 355-nm laser. At laser fluence of 0.4  J/cm2, gratings with spatial periods of 3.8  μm to 344 nm were created. The highest aspect ratio of the grating structure (0.8) was obtained for the 344-nm grating. An all-polymer dye laser was then fabricated by spin-coating a layer of disodium fluorescein (DF)-doped polyvinyl alcohol (PVA) film on bare and patterned PI substrate. Green laser emission was obtained when transversely pumped by a 355-nm laser. The lasing threshold reduced by ∼10 times for the sample with 344-nm grating while the laser intensity was ∼18 times higher. The enhancements are ascribed to the 344-nm grating structures, which act as an efficient distributed feedback resonator and distributed Bragg reflector grating for DF-doped PVA emitting at ∼563  nm, on top of being a passive light-trapping structures.

Paper Details

Date Published: 8 February 2016
PDF: 9 pages
J. Nanophoton. 10(3) 033003 doi: 10.1117/1.JNP.10.033003
Published in: Journal of Nanophotonics Volume 10, Issue 3
Show Author Affiliations
Soon Yie Kok, Multimedia Univ. (Malaysia)
Teck Yong Tou, Multimedia Univ. (Malaysia)
Seong Ling Yap, Univ. of Malaya (Malaysia)
Seong Shan Yap, Univ. of Malaya (Malaysia)

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