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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Development of extreme ultraviolet scatterometer using multiple orders of high-harmonic generation
Author(s): Yi-Sha Ku; Wei-Ting Wang; Yi-Chang Chen; Ming-Chang Chen; Chia-Liang Yeh; Chun-Wei Lo

Paper Abstract

We developed an extreme ultraviolet (EUV) scatterometer equipped with a table-top EUV source for the characterization of nanoscale grating lines. Appropriate orders of high-harmonic generation at wavelengths ranging from 25 to 35 nm are selected as the coherent light source for high-resolution spatial performance. It is shown that the grating surface profile significantly affects the scattered diffraction intensities and can be retrieved by the structure reconstruction algorithms using inverse modeling by rigorous coupled wave analysis.

Paper Details

Date Published: 24 February 2018
PDF: 5 pages
J. Micro/Nanolith. MEMS MOEMS 17(1) 014001 doi: 10.1117/1.JMM.17.1.014001
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 17, Issue 1
Show Author Affiliations
Yi-Sha Ku, Industrial Technology Research Institute (Taiwan)
National Tsing Hua Univ. (Taiwan)
Wei-Ting Wang, Industrial Technology Research Institute (Taiwan)
National Tsing Hua Univ. (Taiwan)
Yi-Chang Chen, Industrial Technology Research Institute (Taiwan)
National Tsing Hua Univ. (Taiwan)
Ming-Chang Chen, National Tsing Hua Univ. (Taiwan)
Chia-Liang Yeh, Industrial Technology Research Institute (Taiwan)
Chun-Wei Lo, Industrial Technology Research Institute (Taiwan)


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