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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Lithographic Stochastics: Beyond 3σ (erratum)

Paper Abstract

This article corrects an error in the original publication.

Paper Details

Date Published: 19 September 2017
PDF: 1 pages
J. Micro/Nanolith. MEMS MOEMS 16(3) 039801 doi: 10.1117/1.JMM.16.3.039801
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 16, Issue 3
Show Author Affiliations
Robert L. Bristol, Intel Corp. (United States)
Marie E. Krysak, Intel Corp. (United States)


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