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Journal of Micro/Nanolithography, MEMS, and MOEMS

Multitaper and multisegment spectral estimation of line-edge roughness
Author(s): Yao Luo; Serap A. Savari
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Paper Abstract

Line-edge roughness (LER) has important impacts on the quality of semiconductor device performance, and power spectrum estimates are useful tools in characterizing it. These estimates are often obtained by taking measurements of many lines and averaging a classical power spectrum estimate from each one. While this approach reduces the uncertainty of the estimates, there are disadvantages to the collection of many measurements. We propose techniques with widespread application in other fields that simultaneously reduce data requirements and the uncertainty of LER power spectrum estimates over current approaches at the price of computational complexity. Multitaper spectral analysis uses an orthogonal collection of data windowing functions or tapers to obtain a set of approximately statistically independent spectrum estimates. The Welch overlapped segment averaging is an earlier approach to reduce the uncertainty of power spectrum estimates. There are known techniques to evaluate the uncertainty of power spectrum estimates. We simulate random rough lines using the Thorsos method.

Paper Details

Date Published: 22 August 2017
PDF: 11 pages
J. Micro/Nanolith. MEMS MOEMS 16(3) 034001 doi: 10.1117/1.JMM.16.3.034001
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 16, Issue 3
Show Author Affiliations
Yao Luo, Texas A&M Univ. (United States)
Serap A. Savari, Texas A&M Univ. (United States)

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