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Journal of Micro/Nanolithography, MEMS, and MOEMS

Dual brush process for selective surface modification in graphoepitaxy directed self-assembly
Author(s): Jan Doise; Boon Teik Chan; Masafumi Hori; Roel Gronheid
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Paper Abstract

Graphoepitaxy directed self-assembly is a potential low-cost solution for patterning via layers with pitches beyond the reach of a single optical lithographic exposure. In this process, selective control of the interfacial energy at the bottom and sidewall of the template is an important but challenging exercise. A dual brush process is implemented, in which two brushes with distinct end-groups are consecutively grafted to the prepattern to achieve fully independent modification of the bottom and sidewall surface of the template. A comprehensive study of hole pattern quality shows that using a dual brush process leads to a substantial improvement in terms of positional and dimensional variability across the process window. These findings will be useful to others who wish to manipulate polymer–surface interactions in directed self-assembly flows.

Paper Details

Date Published: 21 August 2017
PDF: 8 pages
J. Micro/Nanolith. MEMS MOEMS 16(3) 033503 doi: 10.1117/1.JMM.16.3.033503
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 16, Issue 3
Show Author Affiliations
Jan Doise, KU Leuven (Belgium)
IMEC (Belgium)
Boon Teik Chan, IMEC (Belgium)
Masafumi Hori, JSR Micro N.V. (Belgium)
Roel Gronheid, IMEC (Belgium)

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