Share Email Print
cover

Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access • new

Effective–CD: a contribution toward the consideration of line edge roughness in the scatterometric critical dimension metrology
Author(s): Bartosz Bilski; Karsten Frenner; Wolfgang Osten

Paper Abstract

We present an overview of our research on the relation between line edge roughness (LER) and optical critical dimension metrology (OCD). Referring to a known fact that LER does have an impact on OCD, we discuss a novel approach that allows for its better understanding. Namely, we show that, in the presence of LER, one can observe a characteristic scatterometry-measured CD offset, which we call effective–CD. The fact that the effective–CD is characteristic renders it to be a good means of accessing the information about LER present on the CD. To assure the completeness of this overview, we begin by reviewing some previously published results, which have drawn our attention and first led us to observing the characteristic influence of LER on a CD measurement. Next, we extend our model-based simulations to confirm the presence of the effective–CD for complex-roughness models, and finally, we demonstrate an experimental verification of our effective–CD hypothesis. We are convinced that our approach will help to better understand the impact of LER on a CD measurement and will be considered a useful contribution to the development of measurement methods for challenging scenarios, in which realistic CD is affected by the presence of LER.

Paper Details

Date Published: 17 May 2017
PDF: 10 pages
J. Micro/Nanolith. 16(2) 024002 doi: 10.1117/1.JMM.16.2.024002
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 16, Issue 2
Show Author Affiliations
Bartosz Bilski, Institut für Technische Optik (Germany)
Karsten Frenner, Institut für Technische Optik (Germany)
Wolfgang Osten, Institut für Technische Optik (Germany)


© SPIE. Terms of Use
Back to Top