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Journal of Micro/Nanolithography, MEMS, and MOEMS

Fabrication and characterization of microstructures created in thermally deposited arsenic trisulfide by multiphoton lithography
Author(s): Casey M. Schwarz; Chris N. Grabill; Gerald D. Richardson; Shreya Labh; Anna M. Lewis; Aadit Vyas; Benn Gleason; Clara Rivero-Baleine; Kathleen A. Richardson; Alexej Pogrebnyakov; Theresa S. Mayer; Stephen M. Kuebler
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Paper Abstract

A detailed study of multiphoton lithography (MPL) in arsenic trisulfide ( As 2 S 3 ) films and the effects on nanoscale morphology, chemical networking, and the appearance of the resulting features by the chemical composition, deposition rate, etch processing, and inclusion of an antireflection (AR) layer of As 2 Se 3 between the substrate and the As 2 S 3 layer is reported. MPL was used to photo-pattern nanostructured arrays in single- and multilayer films. The variation in chemical composition for laser-exposed, UV-exposed, and unexposed films is correlated with the etch response, nanostructure formation, and deposition conditions. Reflection of the focused beam at the substrate back into the film produces standing wave interference that modulates the exposure with distance from the substrate and produces nanobead structures. The interference and the modulation can be controlled by the addition of an AR layer of As 2 Se 3 deposited between the substrate and the As 2 S 3 film. Relative to structures produced in a single-layer As 2 S 3 film having no AR layer, photo-patterning in the multilayer As 2 S 3 -on- As 2

Paper Details

Date Published: 19 June 2017
PDF: 11 pages
J. Micro/Nanolith. MEMS MOEMS 16(2) 023508 doi: 10.1117/1.JMM.16.2.023508
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 16, Issue 2
Show Author Affiliations
Casey M. Schwarz, University of Central Florida (United States)
Chris N. Grabill, University of Central Florida (United States)
Gerald D. Richardson, University of Central Florida (United States)
Shreya Labh, University of Central Florida (United States)
Anna M. Lewis, University of Central Florida (United States)
Aadit Vyas, University of Central Florida (United States)
Benn Gleason, University of Central Florida (United States)
University of Clemson (United States)
Clara Rivero-Baleine, Lockheed Martin (United States)
Kathleen A. Richardson, University of Central Florida (United States)
Alexej Pogrebnyakov, Pennsylvania State University (United States)
Theresa S. Mayer, Pennsylvania State University (United States)
Stephen M. Kuebler, University of Central Florida (United States)
University of Central Florida (United States)
University of Central Florida (United States)


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