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Journal of Micro/Nanolithography, MEMS, and MOEMS

Modeling ellipsometric measurement of three-dimensional structures with rigorous coupled wave analysis and finite element method simulations
Author(s): Samuel O’Mullane; Nick Keller; Alain C. Diebold
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Paper Abstract

Using rigorous coupled wave analysis (RCWA) and finite element method (FEM) simulations together, many interesting ellipsometric measurements can be investigated. This work specifically focuses on simulating copper grating structures that are plasmonically active. Looking at near-field images and Mueller matrix spectra, understanding of physical phenomena is possible. A general strategy for combatting convergence difficulties in RCWA simulations is proposed and applied. The example used is a copper cross-grating structure with known slow convergence. Baseline simulations on simple samples are provided for comparison and determination of FEM accuracy.

Paper Details

Date Published: 21 October 2016
PDF: 8 pages
J. Micro/Nanolith. MEMS MOEMS 15(4) 044003 doi: 10.1117/1.JMM.15.4.044003
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 15, Issue 4
Show Author Affiliations
Samuel O’Mullane, SUNY Polytechnic Institute (United States)
Nick Keller, Nanometrics Inc. (United States)
Alain C. Diebold, SUNY Polytechnic Institute (United States)


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