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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

<italic<In situ</italic< bow change of Al-alloy MEMS micromirrors during 248-nm laser irradiation
Author(s): Alexander Mai; Christopher Bunce; Rene Hübner; Daniel Pahner; Ulrike A. Dauderstädt

Paper Abstract

Micromirror based spatial light modulators (SLMs) developed by the Fraunhofer Institute for Photonic Microsystems are well established in microlithography applications. Serving, e.g., as reflective, programmable photomasks in deep-UV mask writers, they enable highly flexible pattern generation. During operation, the micromirror bow significantly impacts contrast and the resolvable feature size of generated patterns. In some situations, MEMS micromirrors tend to change their bow during laser irradiation. A test regime including a characterization unit for the

Paper Details

Date Published: 21 September 2016
PDF: 9 pages
J. Micro/Nanolith. 15(3) 035502 doi: 10.1117/1.JMM.15.3.035502
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 15, Issue 3
Show Author Affiliations
Alexander Mai, Fraunhofer-Institut für Photonische Mikrosysteme (Germany)
Christopher Bunce, Fraunhofer-Institut für Photonische Mikrosysteme (Germany)
Rene Hübner, Helmholtz-Zentrum Dresden-Rossendorf e. V. (Germany)
Daniel Pahner, Fraunhofer-Institut für Photonische Mikrosysteme (Germany)
Ulrike A. Dauderstädt, Fraunhofer-Institut für Photonische Mikrosysteme (Germany)


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