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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Three-dimensional patterning in polymer optical waveguides using focused ion beam milling

Paper Abstract

Waveguide (WG) photonic-bridge taper modules are designed for symmetric planar coupling between silicon WGs and single-mode fibers (SMFs) to minimize photonic chip and packaging footprint requirements with improving broadband functionality. Micromachined fabrication and evaluation of polymer WG tapers utilizing high-resolution focused ion beam (FIB) milling is performed and presented. Polymer etch rates utilizing the FIB and optimal methods for milling polymer tapers are identified for three-dimensional patterning. Polymer WG tapers with low sidewall roughness are manufactured utilizing FIB milling and optically tested for fabrication loss. FIB platforms utilize a focused beam of ions (Ga+) to etch submicron patterns into substrates. Fabricating low-loss polymer WG taper prototypes with the FIB before moving on to mass-production techniques provides theoretical understanding of the polymer taper and its feasibility for connectorization devices between silicon WGs and SMFs.

Paper Details

Date Published: 12 August 2016
PDF: 7 pages
J. Micro/Nanolith. MEMS MOEMS 15(3) 034505 doi: 10.1117/1.JMM.15.3.034505
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 15, Issue 3
Show Author Affiliations
Kevin Kruse, Michigan Technological Univ. (United States)
Derek Burrell, Michigan Technological Univ. (United States)
Christopher Middlebrook, Michigan Technological Univ. (United States)

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