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Journal of Micro/Nanolithography, MEMS, and MOEMS

Advancing x-ray scattering metrology using inverse genetic algorithms
Author(s): Adam F. Hannon; Daniel F. Sunday; Donald Windover; R. Joseph Kline
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Paper Abstract

We compare the speed and effectiveness of two genetic optimization algorithms to the results of statistical sampling via a Markov chain Monte Carlo algorithm to find which is the most robust method for determining real-space structure in periodic gratings measured using critical dimension small-angle x-ray scattering. Both a covariance matrix adaptation evolutionary strategy and differential evolution algorithm are implemented and compared using various objective functions. The algorithms and objective functions are used to minimize differences between diffraction simulations and measured diffraction data. These simulations are parameterized with an electron density model known to roughly correspond to the real-space structure of our nanogratings. The study shows that for x-ray scattering data, the covariance matrix adaptation coupled with a mean-absolute error log objective function is the most efficient combination of algorithm and goodness of fit criterion for finding structures with little foreknowledge about the underlying fine scale structure features of the nanograting.

Paper Details

Date Published: 7 July 2016
PDF: 20 pages
J. Micro/Nanolith. 15(3) 034001 doi: 10.1117/1.JMM.15.3.034001
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 15, Issue 3
Show Author Affiliations
Adam F. Hannon, Massachusetts Institute of Technology (United States)
Daniel F. Sunday, National Institute of Standards and Technology (United States)
Donald Windover, National Institute of Standards and Technology (United States)
R. Joseph Kline, National Institute of Standards and Technology (United States)


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