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Journal of Micro/Nanolithography, MEMS, and MOEMS

Numerical and experimental study of near-field scanning optical lithography using nanoscale bowtie apertures with ultrasmall gap size
Author(s): Li Ding; Jin Qin; Yang Chen; Liang Wang
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Paper Abstract

Nanoscale ridge apertures have been demonstrated to be applied for high-resolution lithography. We performed a numerical study of nanoscale bowtie apertures with different outline dimensions and gap sizes to analyze their detailed field distribution for near-field scanning optical lithography (NSOL). It is found that the high image contrast, which is necessary for good quality lithography, is obtained in the near-field region and decays quickly with increasing distance. Furthermore, a smaller gap size achieves higher image contrast and deeper depth of focus. With the NSOL system, static and scanning lithography experiments are conducted. Combined with the passive flexure stage for contact control, we achieved 18-nm lithography resolution.

Paper Details

Date Published: 29 September 2016
PDF: 4 pages
J. Micro/Nanolith. MEMS MOEMS 15(3) 031611 doi: 10.1117/1.JMM.15.3.031611
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 15, Issue 3
Show Author Affiliations
Li Ding, Univ. of Science and Technology of China (China)
Jin Qin, Univ. of Science and Technology of China (China)
Yang Chen, Univ. of Science and Technology of China (China)
Liang Wang, Univ. of Science and Technology of China (China)


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