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Journal of Micro/Nanolithography, MEMS, and MOEMS

Directed self-assembly compliant flow with immersion lithography: from material to design and patterning
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Paper Abstract

We present a directed self-assembly (DSA) compliant flow for contact/via layers with immersion lithography assuming the graphoepitaxy process for the cylinders’ formation. We demonstrate that the DSA technology enablement needs co-optimization among material, design, and lithography. We show that the number of DSA grouping constructs is countable for the gridded-design architecture. We use template error enhancement factor to choose DSA material, determine grouping design rules, and select the optimum guiding patterns. Our post-pxOPC imaging data show that it is promising to achieve two-mask solution with DSA for the contact/via layer using 193i at 5 nm node.

Paper Details

Date Published: 29 September 2016
PDF: 8 pages
J. Micro/Nanolith. MEMS MOEMS 15(3) 031610 doi: 10.1117/1.JMM.15.3.031610
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 15, Issue 3
Show Author Affiliations
Yuansheng Ma, Mentor Graphics Corp. (United States)
Yan Wang, GLOBALFOUNDRIES Inc. (United States)
James Word, Mentor Graphics Corp. (United States)
Junjiang Lei, Mentor Graphics Corp. (United States)
Joydeep Mitra, Mentor Graphics Corp. (United States)
Juan Andres Torres, Mentor Graphics Corp. (United States)
Le Hong, Mentor Graphics Corp. (United States)
Germain L. Fenger, Mentor Graphics Corp. (United States)
Daman Khaira, Mentor Graphics Corp. (United States)
Moshe E. Preil, KLA-Tencor Corp. (United States)
GLOBALFOUNDRIES Inc. (United States)
Jongwook Kye, GLOBALFOUNDRIES Inc. (United States)
Harry J. Levinson, GLOBALFOUNDRIES Inc. (United States)

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