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Journal of Micro/Nanolithography, MEMS, and MOEMS

Optics-free, plasma-based lithography in inorganic resists made up of nanoparticles
Author(s): Santosh Shaw; Kyle J. Miller; Julien L. Colaux; Ludovico Cademartiri
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Paper Abstract

We describe a lithographic approach—nanocrystal plasma polymerization-based lithography—in which colloidal nanocrystal assemblies (CNAs) are used as the inorganic resist and, potentially, the active material. The patterning process is based on a change in the dispersibility of the CNAs in solvents as a result of the exposure to plasmas. Plasmas can etch the capping ligands from the exposed area. During the development step, the unexposed area of CNAs is redispersed, leaving behind the patterned area, similar to what is expected from negative photoresist.

Paper Details

Date Published: 6 September 2016
PDF: 6 pages
J. Micro/Nanolith. 15(3) 031607 doi: 10.1117/1.JMM.15.3.031607
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 15, Issue 3
Show Author Affiliations
Santosh Shaw, Iowa State Univ. of Science and Technology (United States)
Kyle J. Miller, Iowa State Univ. of Science and Technology (United States)
Julien L. Colaux, Univ. of Surrey (United Kingdom)
Ludovico Cademartiri, Iowa State Univ. of Science and Technology (United States)
Ames Lab. (United States)


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