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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Errata: Viability of pattern shift for defect-free extreme ultraviolet lithography photomasks
Author(s): Zhengqing J. Qi; Jed H. Rankin; Eisuke Narita; Masayuki Kagawac

Paper Details

Date Published: 15 February 2016
PDF: 1 pages
J. Micro/Nanolith. 15(2) 029801 doi: 10.1117/1.JMM.15.2.029801
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 15, Issue 2
Show Author Affiliations
Zhengqing J. Qi, GLOBALFOUNDRIES Inc. (United States)
Jed H. Rankin, GLOBALFOUNDRIES Inc. (United States)
Eisuke Narita, Toppan Photomasks, Inc. (United States)
Masayuki Kagawac, Toppan Photomasks, Inc. (United States)


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