Share Email Print
cover

Journal of Micro/Nanolithography, MEMS, and MOEMS

Throughput compensation through optical proximity correction for realization of an extreme ultraviolet pellicle
Format Member Price Non-Member Price
PDF $20.00 $25.00

Paper Abstract

The absorption of extreme ultraviolet (EUV) light by the mask-protecting pellicle could be the most critical problem preventing widespread EUV adoption because EUV source power is still too limited to facilitate its use in mass production. We found that transmission loss due to the EUV pellicle could be compensated through the use of proper optical proximity correction (OPC) applied to the mask-pellicle system. Patterning results of optical proximity correction corrected masks with different transmission pellicles are shown for various one-dimensional and two-dimensional patterns. From the results, it is clearly shown that we do not need to increase the dose to avoid the throughput loss, even when using a pellicle with 80% one-pass transmission. The OPC process described in this paper can speed EUV adoption by allowing the use of much thicker films with higher absorption.

Paper Details

Date Published: 9 June 2016
PDF: 7 pages
J. Micro/Nanolith. 15(2) 023506 doi: 10.1117/1.JMM.15.2.023506
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 15, Issue 2
Show Author Affiliations
Ki-Ho Ko, Hanyang Univ. (Korea, Republic of)
Soo-Yeon Mo, Hanyang Univ. (Korea, Republic of)
In-Seon Kim, Hanyang Univ. (Republic of Korea)
Hye-Keun Oh, Hanyang Univ. (Korea, Republic of)


© SPIE. Terms of Use
Back to Top