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Journal of Micro/Nanolithography, MEMS, and MOEMS

High-order distortion control using a computational prediction method for device overlay
Author(s): Young Seog Kang; Cedric Affentauschegg; Jan Mulkens; Jang-Sun S. Kim; Ju Hee Shin; Young Ha Kim; YoungSun Nam; Young-Sin Choi; Hunhwan Ha; Dong-Han Lee; Jae-il Lee; Umar Rizvi; Bernd Geh; Rob W. van der Heijden; Jan Baselmans; Oh-Sung Kwon
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Paper Abstract

As a result of the continuously shrinking features of the integrated circuit, the overlay budget requirements have become very demanding. Historically, overlay has been performed using metrology targets for process control, and most overlay enhancements were achieved by hardware improvements. However, this is no longer sufficient, and we need to consider additional solutions for overlay improvements in process variation using computational methods. In this paper, we present the limitations of third-order intrafield distortion corrections based on standard overlay metrology and propose an improved method which includes a prediction of the device overlay and corrects the lens aberration fingerprint based on this prediction. For a DRAM use case, we present a computational approach that calculates the overlay of the device pattern using lens aberrations as an additional input, next to the target-based overlay measurement result. Supporting experimental data are presented that demonstrate a significant reduction of the intrafield overlay fingerprint.

Paper Details

Date Published: 29 March 2016
PDF: 10 pages
J. Micro/Nanolith. 15(2) 021403 doi: 10.1117/1.JMM.15.2.021403
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 15, Issue 2
Show Author Affiliations
Young Seog Kang, SAMSUNG Electronics Co., Ltd. (Republic of Korea)
Cedric Affentauschegg, ASML Netherlands B.V. (Netherlands)
Jan Mulkens, ASML Netherlands B.V. (Netherlands)
Jang-Sun S. Kim, SAMSUNG Electronics Co., Ltd. (Republic of Korea)
Ju Hee Shin, SAMSUNG Electronics Co., Ltd. (Republic of Korea)
Young Ha Kim, SAMSUNG Electronics Co., Ltd. (Republic of Korea)
YoungSun Nam, SAMSUNG Electronics Co., Ltd. (Republic of Korea)
Young-Sin Choi, SAMSUNG Electronics Co., Ltd. (Republic of Korea)
Hunhwan Ha, SAMSUNG Electronics Co., Ltd. (Republic of Korea)
Dong-Han Lee, SAMSUNG Electronics Co., Ltd. (Republic of Korea)
Jae-il Lee, SAMSUNG Electronics Co., Ltd. (Republic of Korea)
Umar Rizvi, ASML Netherlands B.V. (Netherlands)
Bernd Geh, Carl Zeiss SMT Inc. (United States)
Rob W. van der Heijden, Technische Univ. Eindhoven (Netherlands)
ASML Netherlands B.V. (Netherlands)
Jan Baselmans, ASML Netherlands B.V. (Netherlands)
Oh-Sung Kwon, ASML Korea Co., Ltd. (Republic of Korea)


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