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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Special Section Guest Editorial:Control of Integrated Circuit Patterning Variance, Part 2: Image Placement, Device Overlay, and Critical Dimension
Author(s): Alexander Starikov

Paper Abstract

This PDF file contains the editorial “Special Section Guest Editorial:Control of Integrated Circuit Patterning Variance, Part 2: Image Placement, Device Overlay, and Critical Dimension” for JM3 Vol. 15 Issue 02

Paper Details

Date Published: 30 June 2016
PDF: 2 pages
J. Micro/Nanolith. 15(2) 021401 doi: 10.1117/1.JMM.15.2.021401
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 15, Issue 2
Show Author Affiliations
Alexander Starikov, I & I Consulting (United States)


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