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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access • new

Special Section Guest Editorial:Extending VLSI and Alternative Technology with Optical and Complementary Lithography

Paper Details

Date Published: 29 June 2016
PDF: 1 pages
J. Micro/Nanolith. 15(2) 021201 doi: 10.1117/1.JMM.15.2.021201
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 15, Issue 2
Show Author Affiliations
Kafai Lai, IBM Thomas J. Watson Research Ctr. (United States)
Andreas Erdmann, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)


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