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Journal of Micro/Nanolithography, MEMS, and MOEMS

Phase imaging results of phase defect using micro-coherent extreme ultraviolet scatterometry microscope
Author(s): Tetsuo Harada; Hiraku Hashimoto; Tsuyoshi Amano; Hiroo Kinoshita; Takeo Watanabe
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Paper Abstract

To evaluate defects on extreme ultraviolet (EUV) masks at the blank state of manufacturing, we developed a micro-coherent EUV scatterometry microscope (micro-CSM). The illumination source is coherent EUV light with a 140 nm focus diameter on the defect using a Fresnel zone plate. This system directly observes the reflection and diffraction signals from a phase defect. The phase and the intensity image of the defect are reconstructed with the diffraction images using ptychography, which is an algorithm of the coherent diffraction imaging. We observed programmed phase defect on a blank EUV mask. Phase distributions of these programmed defects were well reconstructed quantitatively. The micro-CSM is a very powerful tool to review an EUV phase defect.

Paper Details

Date Published: 18 February 2016
PDF: 4 pages
J. Micro/Nanolith. MEMS MOEMS 15(2) 021007 doi: 10.1117/1.JMM.15.2.021007
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 15, Issue 2
Show Author Affiliations
Tetsuo Harada, Univ. of Hyogo (Japan)
Hiraku Hashimoto, Univ. of Hyogo (Japan)
Tsuyoshi Amano, EUVL Infrastructure Development Ctr., Inc. (Japan)
Hiroo Kinoshita, Univ. of Hyogo (Japan)
Takeo Watanabe, Univ. of Hyogo (Japan)

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