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Journal of Micro/Nanolithography, MEMS, and MOEMS

Development of nanoimprint lithography templates toward high-volume manufacturing
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Paper Abstract

Development of nanoimprint lithography (NIL) templates is discussed. The template fabrication process and its performance are presented with consideration of the requirements of NIL for high-volume manufacturing. Defectivity, image placement, and critical dimension uniformity are the three major performance parameters of the templates, and their current status is shown.

Paper Details

Date Published: 5 February 2016
PDF: 4 pages
J. Micro/Nanolith. 15(2) 021006 doi: 10.1117/1.JMM.15.2.021006
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 15, Issue 2
Show Author Affiliations
Koji Ichimura, Dai Nippon Printing Co., Ltd. (Japan)
Kouji Yoshida, Dai Nippon Printing Co., Ltd. (Japan)
Saburo Harada, Dai Nippon Printing Co., Ltd. (Japan)
Takaharu Nagai, Dai Nippon Printing Co., Ltd. (Japan)
Masaaki Kurihara, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)


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