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Journal of Micro/Nanolithography, MEMS, and MOEMS

Optical critical dimension metrology for directed self-assembly assisted contact hole shrink
Author(s): Dhairya Dixit; Avery Green; Erik R. Hosler; Vimal Kamineni; Moshe E. Preil; Nick Keller; Joseph Race; Jun Sung Chun; Michael O’Sullivan; Prasanna Khare; Warren Montgomery; Alain C. Diebold
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Paper Abstract

Directed self-assembly (DSA) is a potential patterning solution for future generations of integrated circuits. Its main advantages are high pattern resolution (∼10  nm), high throughput, no requirement of high-resolution mask, and compatibility with standard fab-equipment and processes. The application of Mueller matrix (MM) spectroscopic ellipsometry-based scatterometry to optically characterize DSA patterned contact hole structures fabricated with phase-separated polystyrene-b-polymethylmethacrylate (PS-b-PMMA) is described. A regression-based approach is used to calculate the guide critical dimension (CD), DSA CD, height of the PS column, thicknesses of underlying layers, and contact edge roughness of the post PMMA etch DSA contact hole sample. Scanning electron microscopy and imaging analysis is conducted as a comparative metric for scatterometry. In addition, optical model-based simulations are used to investigate MM elements’ sensitivity to various DSA-based contact hole structures, predict sensitivity to dimensional changes, and its limits to characterize DSA-induced defects, such as hole placement inaccuracy, missing vias, and profile inaccuracy of the PMMA cylinder.

Paper Details

Date Published: 14 March 2016
PDF: 15 pages
J. Micro/Nanolith. 15(1) 014004 doi: 10.1117/1.JMM.15.1.014004
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 15, Issue 1
Show Author Affiliations
Dhairya Dixit, GLOBALFOUNDRIES Inc. (United States)
Avery Green, GLOBALFOUNDRIES Inc. (United States)
Erik R. Hosler, GLOBALFOUNDRIES Inc. (United States)
Vimal Kamineni, GLOBALFOUNDRIES Inc. (United States)
Moshe E. Preil, GLOBALFOUNDRIES Inc. (United States)
Nick Keller, Nanometrics Inc. (United States)
Joseph Race, Nanometrics Inc. (United States)
Jun Sung Chun, SUNY CNSE/SUNYIT (United States)
Michael O’Sullivan, SUNY CNSE/SUNYIT (United States)
Prasanna Khare, SUNY CNSE/SUNYIT (United States)
Warren Montgomery, SUNY CNSE/SUNYIT (United States)
Alain C. Diebold, SUNY CNSE/SUNYIT (United States)


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