Share Email Print
cover

Journal of Micro/Nanolithography, MEMS, and MOEMS

Architectural strategies in standard-cell design for the 7 nm and beyond technology node
Author(s): Syed Muhammad Yasser Sherazi; Bharani Chava; Peter Debacker; Marie Garcia Bardon; Pieter Schuddinck; Farshad Firouzi; Praveen Raghavan; Abdelkarim Mercha; Diederik Verkest; Julien Ryckaert
Format Member Price Non-Member Price
PDF $20.00 $25.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Standard-cell design and characterization are presented for 7-nm CMOS platform technology targeting low-power and high-performance applications with the tightest contacted poly pitch of 42 nm and a metallization pitch of 32 nm in the FinFET technology. Two standard-cell architectures for 7 nm, a 9-track library and a 7.5-track library have been designed, introducing an extra middle-of-line layer to enable an efficient layout of the 7.5-track cells. The 7.5-track cells are on average smaller than the 9-track cells. With the strict design constraints imposed by self-aligned quadruple patterning and self-aligned double patterning, careful design and technology co-optimization is performed.

Paper Details

Date Published: 25 February 2016
PDF: 11 pages
J. Micro/Nanolith. 15(1) 013507 doi: 10.1117/1.JMM.15.1.013507
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 15, Issue 1
Show Author Affiliations
Syed Muhammad Yasser Sherazi, KU Leuven (Belgium)
Interuniversitair Micro Elektronica Centrum (Belgium)
Bharani Chava, Interuniversitair Micro Elektronica Centrum (Belgium)
Peter Debacker, Interuniversitair Micro Elektronica Centrum (Belgium)
Marie Garcia Bardon, Interuniversitair Micro Elektronica Centrum (Belgium)
Pieter Schuddinck, Interuniversitair Micro Elektronica Centrum (Belgium)
Farshad Firouzi, Interuniversitair Micro Elektronica Centrum (Belgium)
Praveen Raghavan, Interuniversitair Micro Elektronica Centrum (Belgium)
Abdelkarim Mercha, Interuniversitair Micro Elektronica Centrum (Belgium)
Diederik Verkest, Interuniversitair Micro Elektronica Centrum (Belgium)
Julien Ryckaert, Interuniversitair Micro Elektronica Centrum (Belgium)


© SPIE. Terms of Use
Back to Top