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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Enhanced lithographic resolution using longitudinal polarization state of light

Paper Abstract

Laser direct-writing is an important technique for the fabrication of complex patterns. There is a continuous need for structures with increasingly small features, i.e., enhanced resolution. Focused radially polarized light is known to exhibit a narrow longitudinal polarization component. Here, a proof-of-concept is shown of enhanced resolution through polarization-selectivity by the selective recording of the longitudinal polarization component in a polarization-selective homeotropic and smectic B photoresist. The full-width-at-half-maximum (FWHM) of the fabricated spots in the polarization-selective resist is up to 56% smaller compared to the FWHM of the same spot in a photoresist that is not polarization-selective, which supports simulations that predict a theoretical maximum reduction of 62%.

Paper Details

Date Published: 21 December 2015
PDF: 6 pages
J. Micro/Nanolith. 14(4) 043509 doi: 10.1117/1.JMM.14.4.043509
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 14, Issue 4
Show Author Affiliations
My-Phung Van, Technische Univ. Eindhoven (Netherlands)
Technische Univ. Delft (Netherlands)
Katsiaryna Ushakova, Technische Univ. Delft (Netherlands)
Cees W. M. Bastiaansen, Technische Univ. Eindhoven (The Netherlands)
Queen Mary Univ. of London (United Kingdom)
Silvania F. Pereira, Technische Univ. Delft (Netherlands)
H. Paul Urbach, Technische Univ. Delft (The Netherlands)
Dirk J. Broer, Technische Univ. Eindhoven (Netherlands)


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