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Journal of Micro/Nanolithography, MEMS, and MOEMS

Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates
Author(s): Ryan Del Re; James Passarelli; Miriam Sortland; Brian Cardineau; Yasin Ekinci; Elizabeth Buitrago; Mark Neisser; Daniel A. Freedman; Robert L. Brainard
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Paper Abstract

Pure thin films of organotin compounds have been lithographically evaluated using extreme ultraviolet lithography (EUVL, 13.5 nm). Twenty compounds of the type R2Sn(O2CR′)2 were spin-coated from solutions in toluene, exposed to EUV light, and developed in organic solvents. Exposures produced negative-tone contrast curves and dense-line patterns using interference lithography. Contrast-curve studies indicated that the photosensitivity is linearly related to the molecular weight of the carboxylate group bound to tin. Additionally, photosensitivity was found to be linearly related to free radical stability of the hydrocarbon group bound directly to tin (R=phenyl, butyl, and benzyl). Dense-line patterning capabilities varied, but two resists in particular show exceptionally good line edge roughness (LER). A resist composed of an amorphous film of (C6H5CH2)2Sn(O2CC(CH3)3)2 (1) achieved 1.4 nm LER at 22-nm half-pitch patterning and a resist composed of (C6H5CH2)2Sn(O2CC6H5)2 (2) achieved 1.1 nm LER at 35-nm half-pitch at high exposure doses (600  mJ/cm2). Two photoresists that use olefin-based carboxylates, (C6H5CH2)2Sn(O2CCHCH2)2 (3) and (C6H5CH2)2Sn(O2CC(CH3)CH2)2 (4), demonstrated better photospeeds (5  mJ/cm2 and 27  mJ/cm2) but worse LER.

Paper Details

Date Published: 9 November 2015
PDF: 7 pages
J. Micro/Nanolith. MEMS MOEMS 14(4) 043506 doi: 10.1117/1.JMM.14.4.043506
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 14, Issue 4
Show Author Affiliations
Ryan Del Re, SUNY CNSE/SUNYIT (United States)
James Passarelli, SUNY CNSE/SUNYIT (United States)
Miriam Sortland, SUNY CNSE/SUNYIT (United States)
Brian Cardineau, SUNY CNSE/SUNYIT (United States)
Yasin Ekinci, Paul Scherrer Institut (Switzerland)
Elizabeth Buitrago, Paul Scherrer Institut (Switzerland)
Mark Neisser, SUNY Poly SEMATECH (United States)
Daniel A. Freedman, State Univ. of New York at New Paltz (United States)
Robert L. Brainard, SUNY CNSE/SUNYIT (United States)

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