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Journal of Micro/Nanolithography, MEMS, and MOEMS

Direct-writing lithography using laser diode beam focused with single elliptical microlens
Author(s): Md. Nazmul Hasan; Muttahid-Ull Haque; Jonathan Trisno; Yung-Chun Lee
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Paper Abstract

A lithography method is proposed for arbitrary patterning using an elliptically diverging laser diode beam focused with a single planoconvex elliptical microlens. Simulations are performed to model the propagation properties of the laser beam and to design the elliptical microlens, which has two different profiles in the x- and y-axis directions. The microlens is fabricated using an excimer laser dragging method and is then attached to the laser diode using double-sided optically cleared adhesive (OCA) tape. Notably, the use of OCA tape removes the need for a complicated alignment procedure and thus significantly reduces the assembly cost. The minimum focused spot of the laser diode beam is investigated by performing single-shot exposure tests on a photoresist (PR) layer. Finally, the practical feasibility of this lithography technique to generate an arbitrary pattern is demonstrated by dotted and continuous features through thin chromium layer deposition on PR and a metal lift-off process. The results show that the minimum feature size for the dotted patterns is around 6.23  μm, while the minimum linewidths for continuous patterns is 6.44  μm. In other words, the proposed focusing technique has significant potential for writing any arbitrary high-resolution pattern for applications like printed circuit board fabrication.

Paper Details

Date Published: 2 November 2015
PDF: 7 pages
J. Micro/Nanolith. 14(4) 043505 doi: 10.1117/1.JMM.14.4.043505
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 14, Issue 4
Show Author Affiliations
Md. Nazmul Hasan, National Cheng Kung Univ. (Taiwan)
Muttahid-Ull Haque, National Cheng Kung Univ. (Taiwan)
Jonathan Trisno, National Cheng Kung Univ. (Taiwan)
Yung-Chun Lee, National Cheng Kung Univ. (Taiwan)

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