Share Email Print

Journal of Micro/Nanolithography, MEMS, and MOEMS

Improvement of measurement accuracy in digital holographic microscopy by using dual-wavelength technique
Author(s): Jianglei Di; Jiwei Zhang; Teli Xi; ChaoJie Ma; Jianlin Zhao
Format Member Price Non-Member Price
PDF $20.00 $25.00

Paper Abstract

In traditional dual-wavelength digital holographic microscopy (DHM), a synthetic wavelength is obtained by using two lasers with different wavelengths, and the measurement range of the samples’ step height can be expanded from nanometers to micrometers. However, the measurement accuracy reduces along with the expansion of the measuring range, and significant noise is simultaneously introduced in this process. For cases where the sample’s step height is smaller than the wavelength of the illumination light, the measurement accuracy is very important. We present a new approach for dual-wavelength DHM. The synthetic wavelength is shorter than either of the two lasers, and thus higher measurement accuracy can be achieved. The numerical simulation and experiment results show the feasibility of this technique.

Paper Details

Date Published: 20 October 2015
PDF: 6 pages
J. Micro/Nanolith. MEMS MOEMS 14(4) 041313 doi: 10.1117/1.JMM.14.4.041313
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 14, Issue 4
Show Author Affiliations
Jianglei Di, Northwestern Polytechnical Univ. (China)
Jiwei Zhang, Northwestern Polytechnical Univ. (China)
Teli Xi, Northwestern Polytechnical Univ. (China)
ChaoJie Ma, Northwestern Polytechnical Univ. (China)
Jianlin Zhao, Northwestern Polytechnical Univ. (China)

© SPIE. Terms of Use
Back to Top