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Journal of Micro/Nanolithography, MEMS, and MOEMS

Creation of guiding patterns for directed self-assembly of block copolymers by resistless direct e-beam exposure
Author(s): Laura Evangelio; Marta Fernández-Regúlez; Xavier Borrisé; Matteo Lorenzoni; Jordi Fraxedas; Francesc Pérez-Murano
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Paper Abstract

We present an approach for the creation of guiding patterns to direct the self-assembly of block copolymers. A neutral layer of a brush polymer is directly exposed by electrons, causing the cross-linking of the brush molecules, and thus changing its local affinity. The advantage relies on the achievable resolution and the reduction of the process steps in comparison with deep UV and conventional electron beam lithography, since it avoids the use of a resist. We envision that this method will be highly valuable for the investigation of high-chi directed self-assembly materials and complex guiding pattern designs, where pattern placement and resolution are becoming critical.

Paper Details

Date Published: 21 September 2015
PDF: 5 pages
J. Micro/Nanolith. 14(3) 033511 doi: 10.1117/1.JMM.14.3.033511
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 14, Issue 3
Show Author Affiliations
Laura Evangelio, Instituto de Microelectrónica de Barcelona (Spain)
Institut Català de Nanotecnologia (Spain)
Marta Fernández-Regúlez, Institut de Microelectrònica de Barcelona (Spain)
Xavier Borrisé, Institut Català de Nanotecnologia (Spain)
Matteo Lorenzoni, Instituto de Microelectrónica de Barcelona (Spain)
Jordi Fraxedas, Institut Català de Nanotecnologia (Spain)
Francesc Pérez-Murano, Instituto de Microelectrónica de Barcelona (Spain)

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