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Journal of Micro/Nanolithography, MEMS, and MOEMS

Step-and-repeat nanoimprint on pre-spin coated film for the fabrication of integrated optical devices
Author(s): Giuseppe Calafiore; Alexander Koshelev; Alexander Goltsov; Scott D. Dhuey; Simone Sassolini; Martin Messerschmidt; Vladimir Yankov; Arne Schleunitz; Carlos A. Piña-Hernandez; Fabrizio Candido Pirri; Stefano Cabrini; Christophe Peroz
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Paper Abstract

A step-and-repeat nanoimprint lithography (SR-NIL) process on a pre-spin-coated film is employed for the fabrication of an integrated optical device for on-chip spectroscopy. The complex device geometry has a footprint of about 3  cm2 and comprises several integrated optical components with different pattern size and density. Here, a new resist formulation for SR-NIL was tested for the first time and proved effective at dramatically reducing the occurrence of systematic defects due to film dewetting, trapped bubbles, and resist peel-off. A batch of 180 dies were imprinted, and statistics on the imprint success rate is discussed. Devices were optically characterized and benchmarked to an identical chip that was fabricated by electron-beam lithography. The overall performance of the imprinted nanospectrometers is well-aligned with that of the reference chip, which demonstrates the great potential of our SR-NIL for the low-cost manufacturing of integrated optical devices.

Paper Details

Date Published: 7 August 2015
PDF: 7 pages
J. Micro/Nanolith. 14(3) 033506 doi: 10.1117/1.JMM.14.3.033506
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 14, Issue 3
Show Author Affiliations
Giuseppe Calafiore, Abeam Technologies, Inc. (United States)
Politecnico di Torino (Italy)
The Molecular Foundry (United States)
Alexander Koshelev, Abeam Technologies, Inc. (United States)
Moscow Institute of Physics and Technology (Russia)
Alexander Goltsov, Nano-Optic Devices (United States)
Scott D. Dhuey, The Molecular Foundry (United States)
Simone Sassolini, The Molecular Foundry (United States)
Martin Messerschmidt, micro resist technology GmbH (Germany)
Vladimir Yankov, Nano-Optic Devices (United States)
Arne Schleunitz, micro resist technology GmbH (Germany)
Carlos A. Piña-Hernandez, Abeam Technologies, Inc. (United States)
Fabrizio Candido Pirri, Politecnico di Torino (Italy)
Stefano Cabrini, The Molecular Foundry (United States)
Christophe Peroz, Abeam Technologies, Inc. (United States)


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