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Journal of Micro/Nanolithography, MEMS, and MOEMS

Directed self-assembly graphoepitaxy template generation with immersion lithography
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Paper Abstract

We present an optimization methodology for the template designs of subresolution contacts using directed self-assembly (DSA) with graphoepitaxy and immersion lithography. We demonstrate the flow using a 60-nm-pitch contact design in doublet with Monte Carlo simulations for DSA. We introduce the notion of template error enhancement factor (TEEF) to gauge the sensitivity of DSA printing infidelity to template printing infidelity and evaluate optimized template designs with TEEF metrics. Our data show that source mask optimization and inverse lithography technology are critical to achieve sub-80 nm non-L0 pitches for DSA patterns using 193i.

Paper Details

Date Published: 11 September 2015
PDF: 10 pages
J. Micro/Nanolith. 14(3) 031216 doi: 10.1117/1.JMM.14.3.031216
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 14, Issue 3
Show Author Affiliations
Yuansheng Ma, Mentor Graphics Corp. (United States)
Junjiang Lei, Mentor Graphics Corp. (United States)
J. Andres-Torres, Mentor Graphics Corp. (United States)
Le Hong, Mentor Graphics Corp. (United States)
James Word, Mentor Graphics Corp. (United States)
Germain L. Fenger, Mentor Graphics Corp. (Belgium)
Alexander Tritchkov, Mentor Graphics Corp. (United States)
George Lippincott, Mentor Graphics Corp. (United States)
Rachit Gupta, Mentor Graphics Corp. (United States)
Neal V. Lafferty, Mentor Graphics Corp. (United States)
Yuan He, Mentor Graphics Corp. (United States)
Joost P. Bekaert, IMEC (Belgium)
Geert Vanderberghe, IMEC (Belgium)


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