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Journal of Micro/Nanolithography, MEMS, and MOEMS

Efficient layout data compression algorithm and its low-complexity, high-performance hardware decoder implementation for multiple electron-beam direct-write systems
Author(s): Chin-Khai Tang; Ming-Shing Su; Yi-Chang Lu
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Paper Abstract

A lossless electron-beam layout (EBL) data compression algorithm, LineDiff Entropy v2.0, and its low-complexity, high-performance hardware decoder for multiple electron-beam direct-write lithography systems are proposed. The algorithm compares consecutive data scanlines and encodes the data based on the change/no-change of pixel values and the lengths of pixel sequences. Then, the compaction steps of data omission, merging, and encoding of consecutive long identical scanlines are applied. Unique short codes are assigned to data with high occurrence frequency. The hardware decoder is designed as three circuit blocks that perform entropy decoding, decompaction, and EBL data generation through parallel outputs. The results demonstrate that our algorithm can achieve excellent compression performance and that the hardware decoder can decompress data at very high data rates.

Paper Details

Date Published: 11 August 2015
PDF: 15 pages
J. Micro/Nanolith. 14(3) 031212 doi: 10.1117/1.JMM.14.3.031212
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 14, Issue 3
Show Author Affiliations
Chin-Khai Tang, National Taiwan Univ. (Taiwan)
Ming-Shing Su, QNAP, Inc. (Taiwan)
Yi-Chang Lu, National Taiwan Univ. (Taiwan)


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