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Journal of Micro/Nanolithography, MEMS, and MOEMS

Control of polystyrene-block-poly(methyl methacrylate) directed self-assembly by laser-induced millisecond thermal annealing
Author(s): Alan G. Jacobs; Byungki Jung; Jing Jiang; Christopher K. Ober; Michael O. Thompson
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Paper Abstract

Directed self-assembly of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) during laser thermal annealing at peak temperatures of 300°C–800°C for dwells of 1–10 ms has been explored. The enhanced mobility of polymer chains at these temperatures improves registration compared with conventional thermal anneals. PS-b-PMMA films (forming 15-nm line/space standing lamellae) were cast on chemically patterned substrates with a copolymer neutral layer and annealed by laser and hot plate. Annealing by hot plate or multiple laser scans resulted in well-aligned features over micron length scales. By laser annealing multiple times, defectivity was reduced by ∼60%. However, laser annealing for only 10 ms before performing a hot plate anneal reduced defectivity by <80%. We believe that this reduction arises from improved interfacial alignment of the film to the template during laser annealing near the order–disorder transition.

Paper Details

Date Published: 7 July 2015
PDF: 7 pages
J. Micro/Nanolith. 14(3) 031205 doi: 10.1117/1.JMM.14.3.031205
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 14, Issue 3
Show Author Affiliations
Alan G. Jacobs, Cornell Univ. (United States)
Byungki Jung, Cornell Univ. (United States)
Jing Jiang, Cornell Univ. (United States)
Christopher K. Ober, Cornell Univ. (United States)
Michael O. Thompson, Cornell Univ. (United States)

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