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Journal of Micro/Nanolithography, MEMS, and MOEMS

Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow
Author(s): Hari Pathangi; Boon Teik Chan; Hareen Bayana; Nadia Vandenbroeck; Dieter Van den Heuvel; Lieve Van Look; Paulina Alejandra Rincon-Delgadillo; Yi Cao; JiHoon Kim; Guanyang Lin; Doni Parnell; Kathleen Nafus; Ryota Harukawa; Ito Chikashi; Marco Polli; Lucia D’Urzo; Roel Gronheid; Paul F. Nealey
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Paper Abstract

High-defect density in thermodynamics driven directed self-assembly (DSA) flows has been a major cause of concern for a while and several questions have been raised about the relevance of DSA in high-volume manufacturing. The major questions raised in this regard are: (1) What is the intrinsic level of DSA-induced defects? (2) Can we isolate the DSA-induced defects from the other processes-induced defects? (3) How much do the DSA materials contribute to the final defectivity and can this be controlled? (4) How can we understand the root causes of the DSA-induced defects and their kinetics of annihilation? (5) Can we have block copolymer anneal durations that are compatible with standard CMOS fabrication techniques (in the range of minutes) with low-defect levels? We address these important questions and identify the issues and the level of control needed to achieve a stable DSA defect performance.

Paper Details

Date Published: 2 July 2015
PDF: 12 pages
J. Micro/Nanolith. 14(3) 031204 doi: 10.1117/1.JMM.14.3.031204
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 14, Issue 3
Show Author Affiliations
Hari Pathangi, IMEC (Belgium)
Boon Teik Chan, IMEC (Belgium)
Hareen Bayana, IMEC (Belgium)
Nadia Vandenbroeck, IMEC (Belgium)
Dieter Van den Heuvel, IMEC (Belgium)
Lieve Van Look, IMEC (Belgium)
Paulina Alejandra Rincon-Delgadillo, IMEC (Belgium)
Yi Cao, EMD Performance Materials Corp. (United States)
JiHoon Kim, EMD Performance Materials Corp. (United States)
Guanyang Lin, EMD Performance Materials Corp. (United States)
Doni Parnell, Tokyo Electron Europe Ltd. (The Netherlands)
Kathleen Nafus, Tokyo Electron America, Inc. (United States)
Ryota Harukawa, KLA-Tencor Corp. (United States)
Ito Chikashi, KLA-Tencor Corp. (United States)
Marco Polli, KLA-Tencor Corp. (United States)
Lucia D’Urzo, Entegris GmbH (Germany)
Roel Gronheid, IMEC (Belgium)
Paul F. Nealey, The Univ. of Chicago (United States)


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