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Journal of Micro/Nanolithography, MEMS, and MOEMS

Optimizing the response time of Ni-based resistive temperature detectors
Author(s): Deok Su Kim; Kyo Sang Choi; Hee Jun Yang; Min Soo Ryu; Ji Sung Chae; Sung Pil Chang
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Paper Abstract

Resistive temperature detectors (RTDs) are widely used to monitor and control the temperature of work environments due to their higher sensitivity, excellent reliability and stability, and very linear output signal compared to other types of temperature detectors. However, RTDs have some shortcomings, including a slow response time. A nickel-based RTDs were designed, fabricated, and characterized in order to achieve faster response times. We used micromachining processes to analyze devices with different resistor thicknesses, distances between resistor lines, and resistor line widths. The response times of the RTDs were measured to be between 7.5104 and 23.4583 s. From these measurement data, we can conclude that thinner RTDs with larger surface areas show improved response times.

Paper Details

Date Published: 18 May 2015
PDF: 7 pages
J. Micro/Nanolith. MEMS MOEMS 14(2) 025002 doi: 10.1117/1.JMM.14.2.025002
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 14, Issue 2
Show Author Affiliations
Deok Su Kim, Inha Univ. (Republic of Korea)
Kyo Sang Choi, Inha Univ. (Republic of Korea)
Hee Jun Yang, Inha Univ. (Korea, Republic of)
Min Soo Ryu, Inha Univ. (Republic of Korea)
Ji Sung Chae, Inha Univ. (Korea, Republic of)
Sung Pil Chang, Inha Univ. (Korea, Republic of)

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