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Journal of Micro/Nanolithography, MEMS, and MOEMS

Subresolution assist features in extreme ultraviolet lithography
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Paper Abstract

Lithographic critical dimension (CD) printing variability can be easily captured with a CD uniformity measurement; however, minimizing the variability is a challenging task that requires manipulation of many variables. Contact hole variability has a direct impact on device performance, while via variability affects metal area scaling and design. Subresolution assist features (SRAFs) have been used in the past to improve lithographic printing variability. SRAFs enhance the image log slope of nearby features but are not intended to print themselves. The role of SRAFs in extreme ultraviolet is explored here.

Paper Details

Date Published: 2 April 2015
PDF: 8 pages
J. Micro/Nanolith. 14(2) 023501 doi: 10.1117/1.JMM.14.2.023501
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 14, Issue 2
Show Author Affiliations
Deniz Civay, GLOBALFOUNDRIES Inc. (United States)
Erik A. Verduijn, GLOBALFOUNDRIES Inc. (Belgium)
Chris H. Clifford, GLOBALFOUNDRIES Inc. (United States)
Pawitter J. Mangat, GLOBALFOUNDRIES Inc. (United States)
Thomas I. Wallow, GLOBALFOUNDRIES Inc. (United States)


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