Share Email Print
cover

Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Special Section Guest Editorial: Control of IC Patterning Variance Part 1: Metrology, Process Monitoring, and Control of Critical Dimension

Paper Details

Date Published: 26 June 2015
PDF: 1 pages
J. Micro/Nanolith. 14(2) 021101 doi: 10.1117/1.JMM.14.2.021101
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 14, Issue 2
Show Author Affiliations
Alexander Starikov, I & I Consulting (United States)
Matthew J. Sendelbach, Nova Measuring Instruments Inc. (United States)


© SPIE. Terms of Use
Back to Top