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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Broader view on extreme ultraviolet masks: adding complementary imaging modes to the SHARP microscope
Author(s): Markus P. Benk; Ryan H. Miyakawa; Weilun L. Chao; Yow-Gwo Wang; Antoine J. Wojdyla; David G. Johnson; Alexander P. Donoghue; Kenneth A. Goldberg

Paper Abstract

The authors are expanding the capabilities of the SHARP microscope by implementing complementary imaging modes. SHARP (the SEMATECH High-NA Actinic Reticle Review Project) is an actinic, synchrotron-based microscope dedicated to extreme ultraviolet photomask research. SHARP’s programmable Fourier synthesis illuminator and its use of Fresnel zoneplate lenses as imaging optics provide a versatile framework, facilitating the implementation of diverse modes beyond conventional imaging. In addition to SHARP’s set of standard zoneplates, we have created more than 100 zoneplates for complementary imaging modes, all designed to extract additional information from photomasks, to improve navigation, and to enhance defect detection. More than 50 new zoneplates are installed in the tool; the remaining lenses are currently in production. We discuss the design and fabrication of zoneplates for complementary imaging modes and present image data, obtained using Zernike phase contrast and different implementations of differential interference contrast (DIC). First results show that Zernike phase contrast can significantly increase the signal from phase defects in SHARP image data, thus improving the sensitivity of the microscope. DIC is effective on a variety of features, including phase defects and intensity speckle from substrate and multilayer roughness. The additional imaging modes are now available to users of the SHARP microscope.

Paper Details

Date Published: 23 February 2015
PDF: 8 pages
J. Micro/Nanolith. 14(1) 013507 doi: 10.1117/1.JMM.14.1.013507
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 14, Issue 1
Show Author Affiliations
Markus P. Benk, Lawrence Berkeley National Lab. (United States)
Ryan H. Miyakawa, Lawrence Berkeley National Lab. (United States)
Weilun L. Chao, Lawrence Berkeley National Lab. (United States)
Yow-Gwo Wang, Univ. of California, Berkeley (United States)
Antoine J. Wojdyla, Lawrence Berkeley National Lab. (United States)
David G. Johnson, Lawrence Berkeley National Lab. (United States)
Alexander P. Donoghue, Lawrence Berkeley National Lab. (United States)
Kenneth A. Goldberg, Lawrence Berkeley National Lab. (United States)


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