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Journal of Micro/Nanolithography, MEMS, and MOEMS

Magnetic debris mitigation system for extreme ultraviolet sources
Author(s): Daniel T. Elg; John R. Sporre; Davide Curreli; Ivan A. Shchelkanov; David N. Ruzic; Karl R. Umstadter
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Paper Abstract

In extreme ultraviolet (EUV) lithography, plasmas are used to generate EUV light. Unfortunately, these plasmas expel high-energy ions and neutrals which damage the collector optic used to collect and focus the EUV light. One of the main problems facing EUV source manufacturers is the necessity to mitigate this debris. A magnetic mitigation system to deflect ionic debris by use of a strong permanent magnet is proposed and investigated. A detailed computational model of magnetic mitigation is presented, and experimental results from an EUV source confirm both the correctness of the model and the viability of magnetic mitigation as a successful means of deflecting ionic debris.

Paper Details

Date Published: 9 February 2015
PDF: 7 pages
J. Micro/Nanolith. 14(1) 013506 doi: 10.1117/1.JMM.14.1.013506
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 14, Issue 1
Show Author Affiliations
Daniel T. Elg, Univ. of Illinois at Urbana-Champaign (United States)
John R. Sporre, Univ. of Illinois at Urbana-Champaign (United States)
Davide Curreli, Univ. of Illinois at Urbana-Champaign (United States)
Ivan A. Shchelkanov, Univ. of Illinois at Urbana-Champaign (United States)
David N. Ruzic, Univ. of Illinois at Urbana-Champaign (United States)
Karl R. Umstadter, KLA-Tencor Corp. (United States)


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