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Journal of Micro/Nanolithography, MEMS, and MOEMS

Epifluorescent direct-write photolithography for microfluidic applications
Author(s): MacCallister Higgins; Emil J. Geiger
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Paper Abstract

We present a technique for fabricating soft-lithography molds created using an epifluorescent microscope. By focusing the UV light emitted from a Hg arc lamp, we demonstrate the ability to direct-write photoresist features with a minimum resolution of 45  μm. This resolution is satisfactory for many microfluidic applications. A major advantage of this technique is its low cost, both in terms of capital investment and on-going expenditures. Furthermore, by using a motorized stage, we can quickly fabricate a design on demand, eliminating the need, cost, and lead-time required for a photomask. With the addition of an electronic shutter, complicated separate structures can be imaged and utilized to make a wide range of microfluidic devices. We demonstrate this technique using dry-film resist due to its low cost, ease of application, and less stringent safety protocols.

Paper Details

Date Published: 29 January 2015
PDF: 7 pages
J. Micro/Nanolith. MEMS MOEMS 14(1) 013504 doi: 10.1117/1.JMM.14.1.013504
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 14, Issue 1
Show Author Affiliations
MacCallister Higgins, Univ. of Nevada, Reno (United States)
Emil J. Geiger, University of Nevada (United States)

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