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Journal of Micro/Nanolithography, MEMS, and MOEMS

In situ aberration measurement method using a phase-shift ring mask
Author(s): Sikun Li; Xiangzhao Wang; Jishuo Yang; Lifeng Duan; Feng Tang; Guanyong Yan
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Date Published: 13 November 2014
PDF: 10 pages
J. Micro/Nanolith. MEMS MOEMS 14(1) 011005 doi: 10.1117/1.JMM.14.1.011005
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 14, Issue 1
Show Author Affiliations
Sikun Li, Shanghai Institute of Optics and Fine Mechanics (China)
Xiangzhao Wang, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of the Chinese Academy of Sciences (China)
Chinese Academy of Sciences (China)
Jishuo Yang, Chinese Academy of Sciences (China)
Univ. of the Chinese Academy of Sciences (China)
Lifeng Duan, Shanghai Micro Electronics Equipment Co., Ltd. (China)
Feng Tang, Chinese Academy of Sciences (China)
Univ. of the Chinese Academy of Sciences (China)
Guanyong Yan, Chinese Academy of Sciences (China)
Univ. of the Chinese Academy of Sciences (China)


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