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Journal of Micro/Nanolithography, MEMS, and MOEMS

Characterizing acid diffusion lengths in chemically amplified resists from measurements of deprotection kinetics
Author(s): Abhijit A. Patil; Yogendra Narayan Pandey; Manolis Doxastakis; Gila E. Stein
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Paper Abstract

The acid-catalyzed deprotection of glassy poly(4-hydroxystyrene-co-

Paper Details

Date Published: 16 December 2014
PDF: 7 pages
J. Micro/Nanolith. MEMS MOEMS 13(4) 043017 doi: 10.1117/1.JMM.13.4.043017
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 13, Issue 4
Show Author Affiliations
Abhijit A. Patil, Univ. of Houston (United States)
Yogendra Narayan Pandey, Univ. of Houston (United States)
Manolis Doxastakis, Argonne National Lab. (United States)
Gila E. Stein, Univ. of Houston (United States)

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