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Journal of Micro/Nanolithography, MEMS, and MOEMS

Diffraction analysis of digital micromirror device in maskless photolithography system
Author(s): Zheng Xiong; Hua Liu; Xiangquan Tan; Zhenwu Lu; Cuixia Li; Liwei Song; Zhi Wang
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Paper Abstract

A digital micromirror device (DMD) acts as a spatial light modulator in a maskless photolithography system. Illuminated by coherent light, DMD performs as a two-dimensional diffraction grating because of its periodical internal structure. Diffraction efficiency is an important factor for evaluating the exposure doses. A diffraction model of DMD based on Fourier analysis demonstrates that errors of the DMD’s manufacture and the precision of the machining of the optical mechanical structure affect the diffraction efficiency. Additionally, analysis of exposure results by the diffraction model of DMD in Tracepro explains the degradation of the exposure quality and is helpful for calibrating the direction of optical focusing.

Paper Details

Date Published: 16 December 2014
PDF: 8 pages
J. Micro/Nanolith. 13(4) 043016 doi: 10.1117/1.JMM.13.4.043016
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 13, Issue 4
Show Author Affiliations
Zheng Xiong, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Univ. of Chinese Academy of Sciences (China)
Hua Liu, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Xiangquan Tan, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Zhenwu Lu, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Cuixia Li, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Univ. of Chinese Academy of Sciences (China)
Liwei Song, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Zhi Wang, Changchun Institute of Optics, Fine Mechanics and Physics (China)


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