Share Email Print
cover

Journal of Micro/Nanolithography, MEMS, and MOEMS

Inkjetable and photo-curable resists for large-area and high-throughput roll-to-roll nanoimprint lithography
Author(s): Manuel W. Thesen; Dieter Nees; Stephan Ruttloff; Maximilian Rumler; Mathias Rommel; Florian Schlachter; Susanne Grützner; Marko Vogler; Arne Schleunitz; Gabi Grützner
Format Member Price Non-Member Price
PDF $20.00 $25.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We report on our development strategy of photo-curable resists for nanoimprint lithography (NIL) based on modularity. Starting with a basic formulation, we address two topics: the integration of fluorinated additives and the enhancement of the dry etching stability. We prove both concepts by the introduction of two different resists derived from the same basic formulation. The viscosity of the novel resist materials was optimized for inkjet dispensing at room temperature (RT). The novel resist materials can be applied either in NIL batch processes or in high-throughput roller processes. Batch-wise imprints were performed on various substrates such as Si or plastics, demonstrating the distinctive application versatility of the novel materials. Dry etching of spin-coated thin films on Si wafers was performed, demonstrating an etch stability versus Si of 3.5:1 by using the resist formulation with improved etching stability. Roll-to-roll NIL at high throughput on large areas was performed with web speeds of up to 30  m min−1 with different stamp materials. We conclude that all resists reported herein can be deposited via inkjet dispensing at RT, are suitable for continuous high-throughput imprinting on flexible substrates, and are applicable in step-wise NIL processes with good etch resistance in dry etch processes.

Paper Details

Date Published: 21 October 2014
PDF: 8 pages
J. Micro/Nanolith. 13(4) 043003 doi: 10.1117/1.JMM.13.4.043003
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 13, Issue 4
Show Author Affiliations
Manuel W. Thesen, micro resist technology GmbH (Germany)
Dieter Nees, JOANNEUM RESEARCH Forschungsgesellschaft mbH (Austria)
Stephan Ruttloff, JOANNEUM RESEARCH Forschungsgesellschaft mbH (Austria)
Maximilian Rumler, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)
Mathias Rommel, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)
Florian Schlachter, AMO GmbH (Germany)
Susanne Grützner, micro resist technology GmbH (Germany)
Marko Vogler, micro resist technology GmbH (Germany)
Arne Schleunitz, micro resist technology GmbH (Germany)
Gabi Grützner, micro resist technology GmbH (Germany)


© SPIE. Terms of Use
Back to Top